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Small Ion DC Sputtering Coater For Conductive Film Preparation of SEM

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Small Ion DC Sputtering Coater For Conductive Film Preparation of SEM

Small Ion DC Sputtering Coater For Conductive Film Preparation of SEM

  • ItemNo :

    Lith-GVC-1000
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Small Ion DC Sputtering Coater For Conductive Film Preparation of SEM



Model:  GVC-1000 DC Ion Sputtering Coater


Product Overview

The GVC-1000 DC Ion Sputtering Coater adopts a microcontroller as its core processor, featuring independent intellectual property and excellent scalability for customized development. Equipped with a 5.1-inch touch LCD screen, it intuitively displays set parameters such as sputtering currentsputtering timeworking current, and remaining time.

Key Specifications

· Sputtering Current: 3–30 mA (continuously adjustable, step: 1 mA)

· Sputtering Time: 1–600 sec (step: 1 sec)

· Safety Interlocks: Dual protection for sputtering current and vacuum level, ensuring immediate shutdown upon triggering to prevent damage.

· Sample Capacity:

o 4 × φ25 mm samples or 6 × φ15 mm samples

o Single sample cup accommodates up to φ50 mm samples.

· Vacuum Performance:

o Ultimate vacuum: <1 Pa

o Pumping speed: 1 L/s

o Chamber size: φ108 × 130 mm

· Additional Features:

o Real-time curves for sputtering current & vacuum level.

o Adjustable screen brightness.

o System/usage time tracking for targets.

Technical Parameters

Category

Specifications

Operation Mode

Magnetron Sputtering

Input Voltage

AC 220V ± 10%, 50Hz

Working Voltage

DC 2400V

Max Power Consumption

500W (host + mechanical pump)

Target Materials

Au, Pt, Au-Pd alloy, Ag, Pb, Cu, Cr, Sb, etc.

Sputtering Gas

Air or Argon

Chamber Material

High-borosilicate glass (φ128 × 100 mm)

Vacuum Pump

Two-stage rotary vane pump (1 L/s)

Sample Stage

φ90 mm (or φ25 × 4 / φ15 × 6)

Dimensions (L×W×H)

424 × 271 × 255 mm

Weight (Host)

11 kg

Operating Environment

5–40°C, <60% RH

Storage Environment

-10–60°C, <80% RH

Product Highlights

✔ Fully Automated Control – No manual needle valve adjustment required.
✔ Quick-Target Replacement – Patented clamp structure for effortless swaps.
✔ Special Seal Design – Protects glass components from damage.
✔ Adjustable Sample Stage – Smooth height adjustment via sliding rod.
✔ Built-in Operation Guide – User-friendly interface for instant proficiency.

Applications

Ideal for conductive film coating in SEM sample preparation, the GVC-1000 ensures simplicity and efficiency. Compatible with a wide range of target materials (Au, Pt, Ag, Cu, etc.) and sputtering gases (Air/Ar).

Small Sputtering Coater




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity