ItemNo :
Lith-BY-JS05MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 days
Model: Lith-BY-JS05 – Product Specifications
1. System Overview
The Lith-BY-JS05 is a compact, benchtop magnetron sputtering system designed for high-performance thin-film deposition in research and laboratory environments. Featuring a dual-target configuration, it supports the deposition of single or multilayer functional films, including conductive, dielectric, optical, and hard coatings. The system combines high vacuum performance, precise process control, and user-friendly operation, making it ideal for material science, semiconductor research, and advanced coating development.
|
Parameter |
Specification |
|
Model |
Lith-BY-JS05 |
|
Type |
Benchtop Laboratory System |
|
Dimensions (W×D×H) |
610 × 420 × 490 mm |
|
Weight |
100 kg |
|
Power Supply |
AC 220V 50Hz / 110V 60Hz |
|
Power Consumption |
<3 kW |
|
Cooling Method |
Water-cooled (target) + Air-cooled (pump) |
|
Warranty |
1 year limited (lifetime support) |
|
Parameter |
Specification |
|
Pump Configuration |
Rotary Pump (4.4 L/s) + Turbo Pump (300 L/s) |
|
Base Pressure |
≤5×10⁻⁵ Pa |
|
Working Pressure |
0.5–5 Pa |
|
Pump-Down Time (to 10⁻³ Pa) |
≤10 minutes |
|
Vacuum Measurement |
Full-range gauge (Atmosphere to 10⁻⁵ Pa) |
|
Parameter |
Specification |
|
Target Configuration |
Dual magnetron targets (independent control) |
|
Target Size |
Ø50 × 3 mm (standard: Cu & Al) |
|
Target Materials |
Metals, alloys, oxides, ceramics |
|
Magnetic Compatibility |
Weak magnetic materials supported |
|
Deposition Rate |
Adjustable (process-dependent) |
|
Parameter |
Specification |
|
Gas Flow Control |
Mass flow controller (Ar/other inert gases) |
|
Power Supply |
DC: 0–600V, 0–1.6A; RF: 300W/500W (optional) |
|
Thickness Monitoring |
Real-time touchscreen control with 257 preloaded materials |
|
Operation Interface |
Dual-screen control system |
|
Parameter |
Specification |
|
Chamber Material |
Stainless steel |
|
Chamber Dimensions |
Outer: Ø260 × 500 mm; Inner: Ø210 × 270 mm |
|
Substrate Holder |
Customizable (max Ø200 mm) |
· Dual-Target Flexibility: Enables co-deposition or sequential layering of dissimilar materials (e.g., metal/oxide stacks).
· High Vacuum Performance: Achieves 5×10⁻⁵ Pa base pressure for contamination-free films.
· Precision Control: Touchscreen interface with real-time thickness monitoring and gas flow regulation.
· Compact Design: Optimized for small labs with limited space.
· Material Versatility: Supports metals, oxides, polymers, and magnetic materials.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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ONLINE
+86 13174506016
Louis@lithmachine.com
+86 18659217588
18659217588
