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High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine

High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

  • ItemNo :

    Lith-SD-650MH
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

High Vacuum RF+DC  Magnetron Ion Sputtering Coater Coating Machine


Model: SD-650MHT| – Product Specifications


Technical Specifications

Parameter

Specification

Vacuum Pump System

Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set

Rotary Pump Speed

50Hz: 16m³/h (4.4 L/s) | 60Hz: 19.2m³/h (5.2 L/s)

Molecular Pump Speed

300 L/s

Ultimate Vacuum

5 × 10⁻⁴ Pa

Working Pressure

0.5 – 5 Pa

Pump-Down Time

>10 min (to 10 Pa)

Vacuum Measurement

Range: Atmosphere to 10⁻⁴ Pa

Gas Control

Mass Flow Controller (MFC)

Chamber Size

φ260mm × 200mm (Metal Chamber)

Magnetron Target Source

Target Size: φ50mm × 3mm (Copper) 

Compatible with Weakly Magnetic Materials

Operation Method

Manual Control (Instruction Manual Provided)

Weight / Dimensions

100kg / 610mm (L) × 420mm (W) × 490mm (H)

Power Supply

AC 110V 60Hz or AC 220V 50Hz

Power Consumption

<3000W

Cooling System

Air Cooling (Pump) + Water Cooling (Sputtering Target)

Warranty

1-Year Limited Warranty with Lifetime Technical Support


Key Features & Applications

Core Advantages

1. Multi-Mode Sputtering

Supports RF (Radio Frequency)DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings.

2. High Vacuum Stability

Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films.

3. Flexible Compatibility

·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples.

·φ50mm target supports copper and weakly magnetic materials for diverse applications.

4. Efficient Cooling System

·Water-cooled target minimizes thermal load during high-power sputtering.

· Air-cooled pump reduces maintenance costs for continuous operation.

Typical Applications

·Research Fields
Thin film deposition, nanostructured coatings, semiconductor device development.

·Industrial Uses
Optical coatings, wear-resistant layers, surface modification of electronic components.


RF Sputter Coater

PVD Sputtering Coater

Mini Sputter Coater

Sputtering Machines





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity