ItemNo :
Lith-BY-JS09MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 days
Model: Lith-BY-JS09| – Product Specifications
Product Overview
The Lith-BY-JS09 is a compact, high-vacuum magnetron sputtering system specifically designed for glovebox-integrated applications. Its space-saving flush-mount design allows the observation window to align perfectly with the glovebox wall, eliminating internal space occupation—a common limitation of traditional sputtering systems. Since its launch, this system has been widely adopted by research institutions for its efficiency and precision.
|
Category |
Specification |
|
Vacuum System |
Rotary vane pump (oil) + Turbo molecular pump (oil-free) |
|
Pumping Speed |
Rotary pump: 16 m³/h (4.4 L/s) @50Hz / 19.2 m³/h (5.2 L/s) @60Hz Turbo pump: 300 L/s |
|
Ultimate Vacuum |
5×10⁻⁵ Pa |
|
Working Pressure |
0.5–5 Pa |
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Pump-Down Time |
≤10 min (to 10⁻³ Pa) |
|
Vacuum Measurement |
From atmosphere to 10⁻⁶ Pa |
|
Gas Control |
Precision gas flow controller |
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Chamber Size |
φ260 mm × 200 mm (metal) |
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Sputtering Target |
φ50 mm × 3 mm (Cu target); suitable for weakly magnetic materials |
|
Power Supply |
AC 220V 50Hz or AC 110V 60Hz |
|
Power Consumption |
≤3000 W |
|
Cooling System |
Air cooling (pump) + Water cooling (sputtering target) |
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Dimensions & Weight |
610 mm (L) × 420 mm (W) × 490 mm (H) / ~100 kg |
|
Warranty |
1-year limited warranty, lifetime technical support |
· Problem Solved: Traditional sputtering systems occupy valuable glovebox space, limiting workflow efficiency.
· Our Solution: The flush-mounted design minimizes protrusion, allowing seamless integration without compromising internal workspace—ideal for labs with limited glovebox capacity.
· Achieves 5×10⁻⁵ Pa ultimate vacuum, ensuring ultra-clean deposition conditions for sensitive materials (e.g., semiconductors, optical coatings).
· Rapid pump-down (≤10 min to 10⁻³ Pa) reduces idle time, enhancing lab productivity.
· Stable gas flow control enables repeatable deposition rates, critical for uniform thin-film growth.
· Broad vacuum measurement range (atmosphere to 10⁻⁶ Pa) ensures accurate monitoring across all process stages.
· Supports argon and other process gases for reactive/non-reactive sputtering.
· Accommodates 50mm targets (Cu standard, customizable for weakly magnetic materials).
· Hybrid air + water cooling prevents overheating during extended operation, ensuring system longevity.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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+86 13174506016
Louis@lithmachine.com
+86 18659217588
18659217588
