Email:Louis@lithmachine.com
ItemNo :
Lith-ETD-2000MMOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
ETD-2000MH-Various weakly magnetic targets
|
Category |
Specification |
|
Target Material |
Various weakly magnetic targets |
|
Target Size |
Ø60-80mm (weakly magnetic targets) |
|
Control Mode |
Manual operation |
|
Chamber |
Borosilicate glass, Ø180mm × H240mm |
|
Sample Stage |
Ø180mm (compatible with Ø80mm stage) |
|
Sputtering Gas |
Supports multiple gases (e.g., Ar) |
|
Vacuum System |
- Turbo molecular pump (80L/s) - Two-stage high-performance vacuum pump |
|
Sputtering Targets |
- Standard: Au (60mm × 0.1mm) - Optional: Ag, Pt (customizable) |
|
Sputtering Current |
0-500A |
|
Ultimate Vacuum |
5×10⁻⁴ Pa |
|
Operating Voltage |
220V, 50Hz |
✔ High Deposition Rate – Enhanced plasma confinement for efficient material utilization.
✔ Low Substrate Heating – Minimized thermal impact on sensitive materials.
✔ Compact Benchtop Design – Ideal for lab-scale thin-film research.
✔ Flexible Target Options – Supports Au, Ag, Pt, and other weakly magnetic materials.
· Semiconductors & Microelectronics – Conductive layers, MEMS, sensors.
· Optical Coatings – Reflective/anti-reflective films.
· Material Science – Nanostructured thin films, surface engineering.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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Louis@lithmachine.com
+0086 15959378975
