3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

ItemNo :
Lith-SBC-16
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

Model: SBC-16 DC Ion Sputtering Coater

Technical Specifications

Parameter

Specification

Target Materials

Standard: Au (Gold), 57mm diameter × 0.1mm thick

Optional: Pt (Platinum)

Standard Sample Holder

Holds 12 SEM stubs, height adjustment range: 60mm

Rotating/Tilting Stage (Optional)

Rotation: 0–60 rpm (continuously adjustable)

Tilt: -90° to +90° (continuously adjustable)

Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)

Dual locking mechanism for secure fixation

Sputtering Current

5–30mA (microprocessor-controlled, programmable)

Meters

Vacuum: Atm – 1×10⁻³ mbar

Current: 0–99mA

Control Method

Microprocessor with Start/Pause buttons

Programmable time (1–999s)

Auto-pumping, sputtering, and venting

Vacuum System

Pumping speed: 133 L/min

Ultimate vacuum: 10⁻⁴ mbar

Noise level: 56 dB

Key Features & Applications

1. Precision and Flexibility

· Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries.

· Dual locking mechanism prevents sample displacement during operation.

2. High-Quality Coating

· Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications.

3. Automated & User-Friendly Operation

· Programmable controls and auto-venting enhance efficiency and safety.

4. Compact & Low-Noise Design

· Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility.

· Low 56 dB noise level ensures a comfortable working environment.

Ideal Applications

· SEM sample preparation (conductive coating)

· Thin-film deposition for research and industrial applications

· Multi-sample processing (supports 12 SEM stubs)

· Angle-dependent deposition (with optional rotating/tilting stage)

This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

HotTags : 3D SEM Preparation Magnetron Sputtering PVD 3D Magnetron Sputtering System PVD Coating System SEM Preparation System Magnetron PVD System

Parameter	Specification
Target Materials	Standard: Au (Gold), 57mm diameter × 0.1mm thick Optional: Pt (Platinum)
Standard Sample Holder	Holds 12 SEM stubs, height adjustment range: 60mm
Rotating/Tilting Stage (Optional)	Rotation: 0–60 rpm (continuously adjustable) Tilt: -90° to +90° (continuously adjustable) Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available) Dual locking mechanism for secure fixation
Sputtering Current	5–30mA (microprocessor-controlled, programmable)
Meters	Vacuum: Atm – 1×10⁻³ mbar Current: 0–99mA
Control Method	Microprocessor with Start/Pause buttons Programmable time (1–999s) Auto-pumping, sputtering, and venting
Vacuum System	Pumping speed: 133 L/min Ultimate vacuum: 10⁻⁴ mbar Noise level: 56 dB