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Small High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Small High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater Small High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

Small High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

  • ItemNo :

    Lith-H20
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Small High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater



Model: H20-MC- High-Vacuum Dual-Target Sputtering Coater


Technical Parameters

Category

Specification

Model

H20-MC

Vacuum System

Oil-free diaphragm pump + molecular pump

Ultimate Vacuum

≤1.0×10⁻⁴ Pa

Pressure Measurement

Full-range cold cathode gauge + front-end Pirani gauge

Gas Control

MFC (Mass Flow Controller) for Ar/O₂/N₂

Target Configuration

Dual targets (independent control, alternate/synchronous sputtering)

Target Compatibility

Metals, alloys, compounds (custom sizes available)

Optional Feature

Real-time thickness monitoring (nanometer precision)

Cooling System

Energy-efficient target cooling

Safety Protections

Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent


Key Features

1. Dual-Target Flexibility

·Enables multi-material deposition (e.g., bilayers, graded films, or interfaces) in a single run.

2. High-Vacuum Precision

·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films.

3. Intelligent Process Control

·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides).

4. User-Optimized Design

·Energy-saving pumps and cooling reduce operational costs without compromising performance.


Typical Applications

· Semiconductors: Electrode/metallization layers, barrier films.

· Optics: Anti-reflective, conductive, or hard coatings.

· Energy: Thin-film batteries, solar cell layers.

· Research: Nanomaterials, heterostructures, surface engineering.


Why Choose H20-MC?

· Lab to Production: Scalable for both R&D prototyping and industrial batch processing.

· Safety & Reliability: Automated safeguards protect equipment and users.

· Customizable: Adaptable to diverse materials and film architectures.

Ion Sputtering System

Small Ion Sputtering




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity