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Au/Carbon Magnetron Sputter Depostion Coater Machine PVD System For SEM

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Au/Carbon Magnetron Sputter Depostion Coater Machine PVD System For SEM

Au/Carbon Magnetron Sputter Depostion Coater Machine PVD System For SEM

  • ItemNo :

    Lith-G20-MC
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Au/Carbon Magnetron Sputter Depostion Coater Machine PVD System For SEM



Model: G20-MC- Au/Carbon Coating Magnetron Sputter Coater


Product Overview

The G20-MC Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research.


Technical Specifications

Category

Parameter

Specification

Core Parameters

Model

G20-MC

 

Vacuum Chamber (mm)

160 × 120

 

Sputtering Voltage

300–700 V

 

Sample Stage (mm)

Adjustable 80–100 diameter

 

Sputtering Type

Magnetron

 

Working Vacuum

2–10 Pa

System Configuration

Power Supply

100–250 VAC, 50/60 Hz

 

Target Size (mm)

φ50 × 0.1

 

Control System

5" Touchscreen (ARM)

 

Max. Power Consumption

100 W

Process Control

Sputtering Current

10–50 mA (±1 mA)

 

Sputtering Time

0–600 s (±1 s)

 

Ultimate Vacuum

<1 Pa

Safety & Monitoring

Vacuum Measurement

Digital Pirani Gauge

 

Protection

Current/Vacuum interlock


Instrument Highlights

1. SEM-Optimized Coating Performance

· Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum

· 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating

· <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm)

2. Intelligent Process Control

· 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density

· Real-time plasma monitoring prevents arcing on sensitive samples

3. Ergonomic Design

· 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens

· Tool-free target change


Target Applications

▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples
▸ Materials Research: Nanowires, polymer films, and porous materials
▸ Failure Analysis: PCB cross-sections and insulating components


Operational Advantages

· One-cycle coating: 12 samples/batch (50% more than competitors)

· Zero thermal damage: Magnetron confinement keeps samples <40°C

· Self-diagnostics: Automatic pump protection and target life counter




Carbon PVD System




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity