Low-Temperature Large-Target Magnetron Sputtering PVD Coater Equipment For SEM Preparation

ItemNo :
Lith-G16-MC
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

Low-Temperature Large-Target Magnetron Sputtering PVD Coater Equipment For SEM Preparation

Model: G16-MC-Low-Temperature SEM Preparation

Key Features & Applications

The G16-MC Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation.

Technical Parameters

Category

Specifications

Dimensions

530 × 300 × 320 mm

Input Voltage

100–250 VAC, 50/60 Hz

Sputtering Voltage

300–600 V (DC)

Target Material

Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.)

Control Mode

5-inch touchscreen (ARM architecture, bilingual UI)

Power Consumption

100 W

Sputtering Current

10–50 mA (1 mA precision)

Sputtering Time

0–600 s (1 s step)

Working Vacuum

2–10 Pa (0.1 Pa resolution)

Ultimate Vacuum

<1 Pa

Vacuum Measurement

Full-range Pirani gauge

Chamber Size

Ø160 × 120 mm

Sample Stage

Ø80–100 mm (holds 12 standard stubs)

Protections

Overcurrent, vacuum safety

System Components

1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition.

2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision).

3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring.

4. Automation: One-touch operation with parameter memory.

5. Data Display: Real-time curves for current, voltage, and vacuum status.

Advantages

· Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM.

· Low Thermal Impact: Magnetron technology reduces sample heating.

· High Throughput: 12-sample capacity with auto-rotation for uniformity.

· Plug-and-Play: No specialized training required.

Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples.

Operation Notes

· Target Replacement: Tool-free design with shielded ring mechanism.

· Maintenance: Oil-lubricated pump (included) with visual oil-level window.

· Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

HotTags : SEM Preparation Low-Temperature PVD Equipment Large-Target PVD Equipment Magnetron Sputtering Equipment SEM PVD Equipment SEM Preparation Coater

Category	Specifications
Dimensions	530 × 300 × 320 mm
Input Voltage	100–250 VAC, 50/60 Hz
Sputtering Voltage	300–600 V (DC)
Target Material	Ø50 × 0.1 mm (Au, Pt, Ag, Pd, etc.)
Control Mode	5-inch touchscreen (ARM architecture, bilingual UI)
Power Consumption	100 W
Sputtering Current	10–50 mA (1 mA precision)
Sputtering Time	0–600 s (1 s step)
Working Vacuum	2–10 Pa (0.1 Pa resolution)
Ultimate Vacuum	<1 Pa
Vacuum Measurement	Full-range Pirani gauge
Chamber Size	Ø160 × 120 mm
Sample Stage	Ø80–100 mm (holds 12 standard stubs)
Protections	Overcurrent, vacuum safety