Lab Au/Pt/Pd/Ag Metal Sputtering Targets PVD Sputtering Coating System

ItemNo :
Lith-GMC-1000
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

Lab Au/Pt/Pd/Ag Metal Sputtering Targets PVD Sputtering Coating System

Model: GMC-1000-Au/Pt/Pd/Ag Metal Sputtering Targets

Product Overview

The GMC-1000 is a next-generation magnetron ion sputtering coater, independently developed and manufactured to set a new benchmark in sample preparation instruments. Featuring one-touch operation and a fully digitized human-machine interface, it delivers high-precision, nanoscale conductive coatings (≤5 nm) for SEM sample preparation, effectively addressing charging effects in non-conductive specimens.

Technical Specifications

Parameter

Specification

Model

GMC-1000

Dimensions

530 × 300 × 320 mm

Power Supply

100–250 VAC, 50/60 Hz

Sputtering Voltage

300–600 V (DC)

Sputtering Current

10–50 mA (±1 mA)

Sputtering Time

0–600 s (±1 s)

Working Vacuum

2–10 Pa (4–8 Pa optimal)

Ultimate Vacuum

<1 Pa

Target Size

Ø50 × 0.1 mm

Sample Stage

Ø65 mm (holds 12 standard stubs)

Vacuum Chamber

Ø120 × 100 mm (130 × 100 mm)*

Control Interface

5-inch touchscreen (ARM-based)

Vacuum Measurement

Piezoelectric Pirani gauge

Pump System

Rotary vane pump

Target Applications

· Material Science: Nanomaterials, thin films, composites.

· Biology & Medicine: Non-conductive tissues, polymers, membranes.

· Electronics: Electrode preparation, semiconductor analysis.

· High-Resolution SEM: Requires minimal grain size (≤5 nm) and low thermal impact.

Installation & Operation

1. Quick Start: Connect power/gas supply (Ar/N₂ optional), load samples, and press START.

2. Automated Workflow: Self-check, real-time monitoring, and auto-venting post-coating.

3. Maintenance: No specialized upkeep; tool-free target replacement (Au/Pt/Pd/Ag).

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

HotTags : Metal Sputtering Targets Ag Sputtering System Au Sputtering System Lab PVD System Metal PVD System Metal Coating System

Parameter	Specification
Model	GMC-1000
Dimensions	530 × 300 × 320 mm
Power Supply	100–250 VAC, 50/60 Hz
Sputtering Voltage	300–600 V (DC)
Sputtering Current	10–50 mA (±1 mA)
Sputtering Time	0–600 s (±1 s)
Working Vacuum	2–10 Pa (4–8 Pa optimal)
Ultimate Vacuum	<1 Pa
Target Size	Ø50 × 0.1 mm
Sample Stage	Ø65 mm (holds 12 standard stubs)
Vacuum Chamber	Ø120 × 100 mm (130 × 100 mm)*
Control Interface	5-inch touchscreen (ARM-based)
Vacuum Measurement	Piezoelectric Pirani gauge
Pump System	Rotary vane pump