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Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

  • ItemNo :

    Lith-JY-S100
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation



Model: JY-S100-Cold Magnetron Sputtering Deposition System


Product Description

The JY-S100 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications.

Key Features

· "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples.

· Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples.

· Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling.

· Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure.

· Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement.

Technical Specifications

Sputtering System

Parameter

Specification

Target Material

Standard: Pt (57mm diameter × 0.1mm thickness) <br> Optional: Au, Au/Pd, Pt/Pd

Sample Stage Rotation

0–60 rpm (continuously adjustable)

Sample Stage Tilt

-45° to +45° (continuously adjustable)

Stage Diameter

40mm (holds 4 standard sample holders; custom sizes available)

Sputtering Current

Microprocessor-controlled (0–99 mA) with safety interlock

Vacuum Range

Atm ~3 Pa

Control Method

Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting

Vacuum Pump

Parameter

Specification

Pumping Speed

133 L/min

Ultimate Vacuum

0.05 Pa

Noise Level

56 dB

Applications & Advantages

· Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials.

· Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research.

· User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility.

· Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.


Conductive Deposition System

Conductive Deposition System




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity