Products
Home Products PVD Coater Magnetron Sputtering Coating System

RF Magnetron Sputtering System for Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition

Product Categories

Contact Us

  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
RF Magnetron Sputtering System for Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition RF Magnetron Sputtering System for Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition

RF Magnetron Sputtering System for Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition

  • ItemNo :

    Lith-SC-SU-II
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

RF Magnetron Sputtering System for Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition



Model: SC-SU-II-Metals & Non-Metals: Insulators, Semiconductors, Carbon-Based Thin Film Deposition



Product Specifications

Parameter

Specification

Model

SC-SU-II

Type

RF Magnetron Sputtering System

Chamber Size

150 × 120 mm

Target Material

50 mm diameter (metals & non-metals, thickness: 1–2 mm)

RF Power

Adjustable (1–500 W)

RF Frequency

13.56 MHz

Matching Network

Automatic impedance matcher

Sputtering Area

50 mm

Ultimate Vacuum

5 Pa (base pressure)

Process Gases

Argon, nitrogen, and other inert gases (flow rate adjustable)

Max. Deposition Rate

8 nm/min


Key Features & Applications

1. Versatile RF Sputtering for Metals & Non-Metals

· RF Power & Auto-Matching: 13.56 MHz RF with automatic impedance matching ensures stable sputtering of both conductive and insulating materials (e.g., oxides, ceramics).

· Broad Applications: Ideal for advanced thin-film research in semiconductors, optics, and functional coatings.

2. Precise Gas Control & High Vacuum Performance

· Adjustable Inert Gas Flow: Supports Ar, N₂, and other inert gases for controlled deposition environments.

· High Purity Deposition: Base vacuum of 5 Pa minimizes contamination, ensuring high-quality film growth.

3. User-Friendly & Efficient Operation

· Quick Target Change: Compatible with 50 mm targets (1–2 mm thick) for flexible material testing.

· Preset Process Recipes: Saves and recalls parameters for repeatable experiments and production.

4. Stable & High-Speed Deposition

· Max Deposition Rate: 8 nm/min with excellent film uniformity.

· Automated Matching: Reduces manual tuning and enhances process stability.


Recommended Applications

✔ Research & Development: Thin-film studies for semiconductors, dielectrics, and optical coatings.
✔ Small-Scale Production: Prototyping and specialized coating applications.
✔ Multi-Material Sputtering: Supports both metallic and non-metallic targets for diverse material systems.


Metal Thin Film Deposition


Thin Film Deposition










PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity