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PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating

PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating

  • ItemNo :

    Lith-SC-SU-I
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

PVD Magnetron Sputtering System for Thin Film Deposition – Ideal for Research Labs, Semiconductor Prototyping, and Optical Coating



Model: SC-SU-I-Sputtering System for Research Labs, Semiconductor Prototyping, and Optical Coating


Product Overview

The Plasma Magnetron Sputtering System (Model: SC-SU-I) is a compact, user-friendly instrument designed for high-quality thin film deposition. With a quartz chamber (150 × 120 mm) and a maximum sputtering rate of 8 nm/min, it is ideal for research and small-scale production requiring precise, uniform coatings. Compatible with inert gases (Ar, N₂) and versatile metal targets (Au, Ag, Pt, etc.), this system combines efficiency with advanced operational features.


Technical Specifications

Parameter

Specification

Quartz Chamber Size

150 × 120 mm

Sample Stage Size

70 mm (diameter)

Sputtering Area

50 mm (diameter)

Max. Vacuum Degree

5 Pa

Process Gases

Argon, Nitrogen (flow rate adjustable)

Max. Sputtering Rate

8 nm/min

Power Consumption

200 W

Dimensions (W×D×H)

360 × 310 × 150 mm

Operating Temperature

0–40°C

Relative Humidity

< 85%

Installation

Horizontal desktop placement


Key Features & Advantages

1. Intuitive Control & Monitoring

4.3" color touchscreen with graphical interface for real-time display of sputtering current, voltage, and vacuum levels.

2. Flexible Gas & Target Options

Adjustable inert gas flow (Ar/N₂) and support for 50 mm diameter metal targets (1–2 mm thickness), enabling quick material swaps and process reproducibility.

3. Modular & User-Centric Design

·Split-type quartz chamber for easy maintenance.

·Height-adjustable sample stage (±20 mm) with rotational alignment.

·Auto-venting post-sputtering simplifies sample handling.

4. Compact & Reliable

·Space-saving footprint with multi-layered software protections for extended durability.

5. Uniform Film Quality

·Dense, homogeneous coatings compatible with noble and transition metals (Au, Ag, Pt, etc.).


Target Applications

· Research Labs: Thin film studies, surface engineering, and material science.

· Semiconductor Prototyping: Deposition of conductive/metallic layers.

· Optics & Electronics: Functional coatings for sensors or display components.

Note: Optimized for small substrates (≤50 mm) and low-to-medium throughput requirements.

Semiconductor Sputtering

Optical Magnetron Sputtering System

Semiconductor PVD System

Lab PVD Sputtering System




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity