Email:Louis@lithmachine.com
ItemNo :
Lith-JCP200MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
Model: JCP200-Multilayer Thin Film Fabrication
|
Parameter |
Specification |
|
Model |
JCP200 |
|
Vacuum Chamber Structure |
Vertical top-opening design, manual gas spring lift |
|
Chamber Dimensions |
Φ220mm × H300mm |
|
Heating Temperature |
Room temperature to 500°C |
|
Substrate Holder Size |
Φ100mm (rotatable, heated) |
|
Film Uniformity |
≤ ±5.0% within Φ50mm area |
|
Sputtering Target |
1 × Φ2-inch magnetron target (DC/RF compatible) |
|
Process Gas Control |
1–2 channels, precision ±0.1 sccm |
|
Control System |
PLC + touchscreen interface |
|
Footprint (Main Unit) |
600mm (L) × 800mm (W) × 1700mm (H) |
|
Power Consumption |
≥6 kW |
|
Base Vacuum |
6.6×10⁻⁵Pa |
|
Pumping Time |
≤15 min (from atmosphere to 7×10⁻³Pa) |
Designed for thin-film research and small-batch production, ideal for:
· Academic labs: Universities and research institutes studying novel materials.
· Industrial R&D: Prototyping functional coatings (e.g., ITO for solar cells, wear-resistant alloys).
1. Multi-Mode Sputtering
·Supports DC, RF, and pulsed sputtering for metals, oxides, and semiconductors.
·Single-/multi-target configurations for layered or composite films.
2. User-Friendly Operation
·Automated PLC control with real-time monitoring via touchscreen.
·Substrate heating (≤300°C) and rotation (2–20 rpm) for uniform coatings.
3. Compact & Reliable
·Minimal footprint, low maintenance, and energy-efficient design.
4. Safety & Precision
·Water-cooling protection, gas flow control (±0.1 sccm), and arc suppression.
1. Installation:
·Ensure stable power (AC 380V ±5%, ≥8 kW), cooling water (≥10 L/min), and proper grounding (<3Ω).
·Verify vacuum seals and gas connections before startup.
2. Operational Workflow:
·Pumping: Start mechanical pump → Open foreline valve → Activate molecular pump (at >5 Pa).
·Deposition: Set substrate temperature → Adjust gas flow → Initiate sputtering (5–15 W/cm² target power).
·Shutdown: Cool substrate (<50°C) → Vent chamber → Maintain pump oil/clean seals regularly.
3. Maintenance Tips:
·Replace mechanical pump oil every 500 operational hours.
·Clean chamber and target surfaces after each use to avoid cross-contamination.
The JCP200 combines research-grade precision with industrial durability, offering:
· Flexibility: Adaptable to diverse materials (metals, dielectrics, etc.).
· Efficiency: Fast pumping, intuitive controls, and low running costs.
· Support: Comprehensive manuals and technical assistance provided.
For advanced applications (e.g., perovskite layers), consult the manufacturer for tailored process parameters.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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Louis@lithmachine.com
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