Email:Louis@lithmachine.com
ItemNo :
Lith-JCP350MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
Model: JCP-Multilayer Thin Film Fabrication
Electronics/Batteries, Steel/Metals, Aerospace, Automotive & Components, Electrical Industries
► Dual-functionality: Supports both sputtering and evaporation processes. Compact footprint, cost-effective, stable performance, and low maintenance.
► Versatile coating capabilities: Deposits single/multi-layer films including metal films (Ag, Al, Cu, Ni, Cr, NiCr alloys), dielectric films (TiO₂, SiO₂), semiconductor films (ITO), magnetic films, heat-resistant alloys, and corrosion-resistant/ hard coatings.
► Flexible configurations: Single-target, sequential multi-target, or co-sputtering modes for multilayer/composite films.
|
Parameter |
Specification |
|
Model |
JCP350 |
|
Chamber Structure |
Vertical top-opening, rear-mounted pumping system, pneumatic lift |
|
Chamber Dimensions |
Φ350 × H350 mm |
|
Heating Temperature |
Room temp. ~ 500°C |
|
Sputtering Mode |
Upward sputtering |
|
Substrate Stage |
Rotating, Φ120 mm |
|
Film Uniformity |
≤±5.0% (Φ75 mm area) |
|
Targets |
2× Φ2" magnetron targets (DC/RF compatible) |
|
Gas Control |
2–3 channels MFC |
|
Control System |
PLC + touchscreen (semi-automatic) |
|
Footprint (Main Unit) |
L1600 × W800 × H1920 mm |
|
Power Consumption |
≥8 kW |
1. Vacuum System:
·Pumps: Compound molecular pump + rotary vane pump, with electric/gas valves.
·Base Pressure: ≤6.6×10⁻⁵ Pa (after 24h pumping).
·Leak Rate: ≤0.8 Pa/h.
·Pump-down Time: ≤15 min (to 5.0×10⁻³ Pa, empty chamber).
2. Substrate Handling:
·Rotation: 0–20 rpm.
·Heating: RT ~ 500±1°C.
3. Target Configuration:
·3× Φ2" magnetron targets (coaxial sputtering).
·Includes DC (2 units) + RF (1 unit) power supplies, with pneumatic shutters.
4. Safety & Control:
·Protections: Overcurrent/voltage, water cooling faults, and interlock system.
·Noise Level: ≤70 dB.
· Research & Production Flexibility: Ideal for nano-scale conductive/magnetic films (Ni, Co), semiconductor layers (ITO, ZnO), and ceramic insulating films.
· Multi-target Synergy: Independent/sequential/co-sputtering modes enable complex multilayer structures.
· User-Friendly: PLC+touchscreen control suits academic labs, R&D centers, and industrial production.
Ideal For: Universities, research institutes, and manufacturers requiring high-precision, repeatable thin-film deposition for advanced materials.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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Louis@lithmachine.com
+0086 15959378975
