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Multi-target Composite Magnetron Sputtering Film Deposition Coating System

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Multi-target Composite Magnetron Sputtering Film Deposition Coating System

Multi-target Composite Magnetron Sputtering Film Deposition Coating System

  • ItemNo :

    Lith-CK600
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Multi-target Composite Magnetron Sputtering Film Deposition Coating System



Model: CK600 -Multi-target, Multi-film Deposition


Specifications

Category

Parameter

Primary Application

Nanoscale monolayer/multilayer films (hard coatings, metals, semiconductors, dielectrics)

Target Users

Universities, research institutes (R&D and small-batch production)

System Composition

Vacuum chamber, sputtering targets, sample stage, vacuum pumps, gas delivery, control systems, film thickness monitor, and auxiliary components

Vacuum Performance

Parameter

Specification

Ultimate Vacuum

6.7 × 10-5 Pa

System Leak Rate

≤1 × 10-7 Pa·L/s

Vacuum Recovery Time

≤40 min (to 6.6 × 10-1 Pa after N2 purge)

Chamber & Sample Stage

Component

Specification

Chamber Dimensions

Ø630 mm × 350 mm (cylindrical)

Sample Capacity

8 × 4-inch substrates (1 mm thickness)

Sputtering Targets

Feature

Specification

Target Types

3 × Permanent magnet targets, 3 × High-intensity magnet targets

Cooling Method

Indirect water-cooled (brazed structure)

Target Diameter

Ø100 mm

Target-Substrate Distance

50–90 mm (manual adjustment, with position indicator)

Sputtering Mode

Vertical downward sputtering

Substrate Control

Parameter

Specification

Bias Voltage

Up to -200 V

Rotation Mechanism

Computer-controlled revolution + rotation (stepper motor-driven)

Temperature Control

RT to 300°C (single calibration required; 3 heaters, one active at a time)

Gas & Thickness Control

Component

Specification

Mass Flow Controllers (MFC)

2 channels

Film Thickness Monitor

Quartz crystal microbalance (0–999,999 Å)

Pumping Options

Configuration

Components

Standard

Turbo molecular pump + dry scroll pump

Alternative

Cryogenic pump + dry scroll pump

Computer Control Features

· Real-time displacement/speed monitoring with error calculation.

· Linear/logarithmic display modes for speed vs. displacement.

· Site-specific deposition via precision positioning.


Key Advantages & Applications

✔ Multi-Target Flexibility – Supports diverse materials (metals, oxides, nitrides).
✔ Uniform Deposition – Computer-controlled rotation ensures film consistency.
✔ High Vacuum Stability – Minimizes contamination for high-purity films.
✔ Research-Ready – Modular design suits optoelectronics, tribological coatings, and semiconductor R&D.

Ideal for: Advanced material science studies and prototyping of functional thin-film devices.


Multi-film Deposition





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity