ItemNo :
Lith-CK300-06MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
Model: CK300-06-Multilayer Thin-Film Fabrication
Parameter |
Specification |
Base Vacuum |
6.7×10−5 Pa |
Operating Vacuum (after 1h) |
≤4×10−4 Pa |
Magnetron Targets |
3 (3-inch, permanent magnet, water-cooled, side shutters) |
Target-to-Substrate Distance |
120–200 mm (manually adjustable, scale-indicated) |
Target Tilt Angle |
0–45° |
Substrate Heating |
Iodine-tungsten lamp, max 400°C |
Substrate Size |
Φ60 mm (single-piece) |
Substrate Rotation |
0–50 RPM (motorized) |
Bias Voltage |
0–200 V (adjustable) |
Gas Flow Control |
2-channel MFC, 0–50 sccm range |
Control Functions |
Manual heating/rotation/shutter/vacuum monitoring |
· Adjustable target-substrate geometry for tailored film stress and uniformity.
· Three-target co-sputtering enables multilayer/composite films (e.g., superlattices).
· UHV-compatible chamber minimizes impurities for high-purity films.
· Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors).
· Benchtop design suits small-batch R&D and material screening.
· Protective coatings (e.g., TiN, DLC for tools).
· Transparent conductive films (e.g., ITO, AZO).
· MEMS/sensor fabrication.
Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity