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Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication

Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication

  • ItemNo :

    Lith-PD-450CS/550CS
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Glovebox PVD Magnetron Sputtering System For Functional Composite Film Deposition Fabrication



Model:  PD-450CS/550CS-PVD Magnetron Sputtering System


Product Overview

The PD-450CS/550CS High-Vacuum Magnetron Sputtering System is a specialized R&D equipment designed for cutting-edge applications in perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs, OPVs, and other advanced industries. It enables the deposition of nanoscale oxide, nitride, and metallic thin films. The system integrates seamlessly with glovebox environments, ensuring anhydrous/oxygen-free conditions for the entire process—from spin-coating and sputtering to testing—via a hardware-coupled PVD and glovebox system.


Key Features

1. Low-Pressure Sputtering Technology (Optional)

1. Delivers dense thin films with minimal substrate damage.

2. High-Precision Chamber Design

1. SUS304 stainless steel sputtering chamber with mirror-polished interior (including shielding plates) for ultra-clean conditions and optimal vacuum performance.

3. Flexible Control Options

1. Manual/Auto Control: Siemens PLC + touchscreen interface.

2. Fully Automated: PC + PLC integration.


Technical Specifications

Parameter

Details

Overall Dimensions (L×W×H)

1100 × 800 × 1900 mm

Chamber Dimensions (L×W×H)

440 × 440 × 450 mm

Substrate Stage

Max. temperature: 500°C (±1°C accuracy)

Ultimate Vacuum

2 × 10−5 Pa

Pumping Speed & Hold

≤8 × 10−4 Pa in 20 min; ≤5 Pa over 12 hours

Deposition Uniformity

±3% to ±5% across the tray

Target Options

Rectangular: 210×210 mm / 300×300 mm; Circular targets available


Applications & Advantages

Ideal For:

· Research & Prototyping: Tailored for sensitive materials requiring inert environments (e.g., perovskites, OLED layers).

· Multi-Process Integration: Combines sputtering, spin-coating, and testing in a single glovebox workflow, minimizing contamination risks.

· High-Quality Films: Superior uniformity and low-defect deposition critical for optoelectronic and energy storage devices.

Why Choose This System?

· Glovebox Compatibility: Unique airtight integration for oxygen/moisture-sensitive processes.

· Versatile Configurations: Supports diverse target geometries and automation levels.

· Industry-Grade Precision: Tight temperature control (±1°C) and high vacuum stability ensure reproducible results.



Film PVD System

PVD System

Glovebox PVD System

Glovebox Sputtering System




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity