Email:Louis@lithmachine.com
ItemNo :
Lith-D300MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
Model: D300- D-Shaped Magnetron Sputtering Coater
Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories.
· Vacuum chamber system (sputtering chamber)
· Target system
· Sample stage system
· Vacuum pumping & measurement system
· Gas flow system
· Control system
· Film thickness monitoring system
· Front-opening door mechanism
· Electrical control system
|
Parameter |
Specification |
|
Ultimate Vacuum |
6.7×10-5 Pa |
|
System Leak Rate |
1×10-7 Pa·L/s |
|
Vacuum Recovery Time |
40 min to 6.6×10 Pa (after N2 purge) |
|
Vacuum Chamber |
D-shaped, 400 × 350 × 300 mm |
|
Sample Stage |
3" × 3", 3.2 mm thickness |
|
Magnetron Targets |
3 targets (2 standard + 1 high-strength) |
|
Effective Sputtering Area |
3" × 3" |
|
Target Diameter |
Φ50 mm (water-cooled) |
|
Target-to-Substrate Distance |
50–90 mm (adjustable) |
|
Substrate Bias Voltage |
-200 V |
|
Sample Turntable |
1 position (holds 2" substrates) |
|
Gas Flow System |
2-channel mass flow controller |
|
Film Thickness Monitor |
0–999,999 Å |
|
Pumping Options |
Turbo molecular pump or cryogenic pump + dry scroll pump |
· Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings.
· Adjustable target-substrate distance ensures optimized film uniformity.
· Computerized real-time tracking of deposition parameters enhances repeatability.
· Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering.
· Fast vacuum recovery minimizes downtime.
· Dual pumping options (turbo or cryogenic) adapt to different process requirements.
· D-shaped chamber & front-opening door facilitate easy sample loading.
· Optional heating expands compatibility with temperature-sensitive materials.
· Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering.
· Functional film development for optics, wear resistance, and electronic devices.
· Prototype fabrication requiring high-precision, customizable coatings.
This system combines high deposition control, flexible configuration, and robust performance, making it a preferred choice for advanced thin-film research and development.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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Louis@lithmachine.com
+0086 15959378975
