Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box

ItemNo :
Lith-ETD-2000C
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

Lab Ion Sputtering & Evaporation PVD Coater Machine for SEM for Glove Box

ETD-2000C| Ion Sputtering & Evaporation Coater for SEM

Specification

Integrated with sputtering and thermal evaporation functions, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters.

Technical Specifications

Parameter	Value
Dimensions	305 mm × 400 mm × 390 mm (W×D×H)
Vacuum Chamber Material	Borosilicate glass, 160 mm × 110 mm (D×H)
Target (Upper Electrode)	50 mm × 0.1 mm (D×H)
Sputtering Targets	Au (standard), optional Ag, Pt, etc.
Target Size	φ50 mm
Sample Stage	Compatible with 50 mm/70 mm diameter; customizable
Sputtering Voltage	0–1600 V (DC), adjustable
Sputtering Current	0–50 mA
Sputtering Timer	0–360 s
Carbon Evaporation Current	0–100 A (AC)
Evaporation Material	Carbon fiber
Evaporation Voltage	0–30 V
Evaporation Time	0–1 s
Gas Inlet Valve	Compatible with φ3 mm tubing
Process Gases	Multiple options
Power Supply	220 V (110 V optional), 50 Hz
Vacuum Pump	2L rotary vane pump (VRD-8, domestic)

Key Features

1. Dual-Function Design

·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications.

·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm).

2. Precision Control

·Adjustable sputtering current, vacuum pressure, and gas selection to optimize coating rate and particle size.

·Digital timer for reproducible processes.

3. Enhanced Sample Protection

·Conductive coatings eliminate charging effects in non-conductive samples.

·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage.

4. Efficiency & Reliability

·Compact footprint with automated vacuum protection to prevent short circuits.

·Uniform film deposition with short processing time.

Applications

· Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage.

· Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging.

· Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites.

PVD Coater

Sputter Coater

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

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