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Mini DC Ion Sputtering Carbon Coater Coating Machine System

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  • Contact Person : Louis Yang
  • Email : Louis@lithmachine.com
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Mini DC Ion Sputtering Carbon Coater Coating Machine System Mini DC Ion Sputtering Carbon Coater Coating Machine System

Mini DC Ion Sputtering Carbon Coater Coating Machine System

  • ItemNo :

    Lith-SD-160
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Product Details

Mini DC Ion Sputtering Carbon Coater Coating Machine System



Model: SD-160 DC Ion Sputtering Coater


Product Overview

The SD-160 Ion Sputtering Coater is a DC (direct current) sputtering deposition system based on a two-electrode DC sputtering principle—a simple, reliable, and cost-effective coating technology widely adopted in industrial applications.

Beyond its fundamental design, the SD-160 features:

· A dedicated sample sputtering chamber

· Vacuum gauge and sputtering current meter

· Adjustable sputtering current controller

· Micro vacuum valve and timer

· Integrated automated circuitry for precise control of chamber pressureionization current, and process gas selection, ensuring optimal coating quality.

Key Innovations

· Durable rubber-sealed bell jar design prevents vacuum leakage and edge chipping during prolonged use.

· Ceramic-sealed high-voltage electrode outperforms conventional rubber seals in longevity.

· Large-capacity sputtering chamber and optimized target area ensure uniform, contaminant-free coatings.

· High-stability solenoid valves and a dual-gas-path automatic control system enhance sample protection and film quality.

Ideal for:

· SEM sample preparation in electron microscopy labs

· Electrode fabrication for R&D research


Technical Specifications

Parameter

Details

Sputtering Gas

Argon, nitrogen, or other gases (selectable per experiment)

Target Material

Standard: Gold target (50mm × 0.1mm thick). Optional: Silver, platinum, etc.

Sputtering Current

Max: 50mA

Deposition Rate

>4nm/min

Chamber Dimensions

Ø160mm × 120mm (H)

Sample Stage

Compatible with Ø50mm and Ø70mm stages (customizable)

Power Supply

220V AC (110V optional), 50Hz



Features Highlight

1. Leap Vacuum Pump: High-performance pumping for consistent vacuum levels.

2. Dual-Gas Control: Isolated gas paths safeguard sample integrity.

3. User-Centric Design: Timed sputtering, adjustable parameters, and modular stage options streamline operation.

Note: Parameters are default for standard configuration. Customizations (e.g., target materials, voltage) available upon request.

Sputtering System

Carbon Coating





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity