ItemNo :
Lith-PC-DZ01MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 days
Versatile Multilayer PVD System For Composite Compound Film Fabrication Deposition
The Lith-PC-DZ01 is designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, making it ideal for research institutions, universities, and small-batch production. Its high precision and versatility allow for advanced material studies and thin-film applications in optoelectronics, microelectronics, and nanotechnology.
The system consists of:
· Evaporation Chamber: U-shaped design (500×600×500 mm) with front-loading access and rear-mounted pumping system.
· E-Gun (Electron Beam Evaporator): High-power electron gun for uniform and high-purity film deposition.
· Thermal Evaporation Electrodes: Supports alternative resistive evaporation (optional).
· Rotating Substrate Heater: Ensures uniform coating with adjustable rotation (5-60 rpm).
· Gas Supply System: Equipped with mass flow controllers for reactive or inert gas deposition.
· Vacuum System: High-efficiency pumping system for rapid evacuation.
· Control System: Automated and manual controls for precise operation.
|
Parameter |
Specification |
|
Ultimate Vacuum |
≤6.7×10⁻⁴ Pa |
|
Pump-Down Time (1×10⁵ Pa → 5×10⁻³ Pa) |
≤20 min |
|
Leak Rate |
≤6.7×10⁻⁷ Pa·L/s |
|
Chamber Dimensions |
500×600×500 mm (U-shaped, front-opening) |
|
E-Gun Specifications |
|
|
- Anode Voltage |
8 kV (1 set) |
|
- Crucible |
Water-cooled, 4 pockets (11 ml each) |
|
- Power Range |
0–8 kW (adjustable) |
|
Resistive Evaporation (Optional) |
|
|
- Voltage |
5 V |
|
- Max. Current |
300 A |
|
- Power |
2 kW (1 set, switchable) |
|
- Water-Cooled Electrodes |
3 rods (forming 2 evaporation boats) |
|
Substrate Specifications |
|
|
- Max. Substrate Size |
4 inches |
|
- Rotation Speed |
5–60 rpm |
|
- Source-Substrate Distance |
300–350 mm |
|
- Heating Temperature |
Up to 600°C (±1°C, adjustable) |
|
- Manual Shutter |
1 set |
|
Gas Control System |
1-channel mass flow controller |
|
Quartz Crystal Monitor |
Thickness display range: 0–99,999 Å |
✔ High Film Uniformity: Rotating substrate holder ensures even deposition.
✔ Precise Thickness Control: Quartz crystal monitor allows real-time monitoring (0–99,999 Å).
✔ Multi-Material Deposition: Supports e-beam evaporation (metals, oxides) and resistive evaporation (low-melting-point materials).
✔ High-Temperature Stability: Substrate heating up to 600°C (±1°C) for improved film adhesion and crystallinity.
✔ Efficient Vacuum System: Fast pump-down and ultra-low leak rate for high-purity deposition.
· Academic Research: Thin-film studies in physics, materials science, and engineering.
· Semiconductor & Optoelectronic R&D: Fabrication of sensors, solar cells, and optical coatings.
· Small-Scale Production: Prototyping and specialized coating applications.
This system is a cost-effective, high-performance solution for laboratories requiring reliable, repeatable thin-film deposition.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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