ItemNo :
Lith-PD-DZ01MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 days
Metal Atomic Layer Film Deposition System For Perovskite Solar Cells, OLEDs,OPVs
Lith-PD-DZ01-Advanced Thin-Film Deposition System
The Lith-PD-DZ01 is a high-performance vacuum deposition system designed for perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs (QLEDs), and organic photovoltaics (OPVs). Supporting thermal evaporation (resistive & e-beam) and organic vapor deposition, it enables the coating of metals (Au, Ag, Ti, Cr, Mo), oxides (SiO₂, ITO, AZO, NiO), and organic semiconductors in a fully inert glovebox-integrated environment.
✔ Dual-Rail Sliding Door – Reduces glovebox space usage by >30% vs. conventional swing-door systems.
✔ Compact External Footprint – No extra lab space required beyond the glovebox.
✔ Siemens PLC + Touchscreen HMI – Enables manual/auto switching, remote PC control, and real-time process monitoring.
✔ Multi-Stage Interlock Protection – Prevents operator errors (e.g., venting under high vacuum).
✔ Leak & Overheat Alarms – Auto-shutdown safeguards sensitive samples.
✔ Ultra-High Vacuum (UHV) Base Pressure – <3×10⁻⁵ Pa minimizes contamination for high-purity films.
✔ Industry-Leading Uniformity (±3%) – Enabled by planetary rotation (5–30 RPM) + adjustable dome height.
✔ Ion-Assisted Deposition (Optional) – Enhances adhesion density by >20% for metal/oxide layers.
✔ Multi-Source Compatibility – Simultaneously supports:
· 8–10 kW E-beam (4–8 crucible positions)
· 4 Resistive Sources (Max. 1500°C)
· 2 Organic Vapor Cells (Precision temp. control ±1°C)
✔ Rapid Material Switching – Crucible turret reduces downtime by >50% vs. single-source systems.
|
Parameter |
Specification |
Performance Impact |
|
Chamber Dimensions |
500×500×600 mm (Standard) / 600×650×800 mm (Large) |
Fits wafer-scale (200×200 mm) substrates; customizable for roll-to-roll R&D. |
|
Base Vacuum |
≤3×10⁻⁵ Pa |
Critical for oxide & organic film purity; outperforms competitors (typical 5×10⁻⁵ Pa). |
|
Holding Pressure |
≤8×10⁻⁴ Pa (30 min pump-down) / ≤5 Pa (12 hrs) |
Ensures long-duration process stability for tandem device fabrication. |
|
Deposition Rate |
0.1–10 Å/s (e-beam) / 0.5–5 Å/s (resistive) |
Wide range supports ultrathin barriers (<10 nm) to thick electrodes (>500 nm). |
|
Substrate Heating |
RT–600°C (Optional) |
Enables in-situ annealing for perovskite crystallization or metal-oxide doping. |
|
Thickness Control |
Quartz crystal monitor (±0.1 nm) + optical feedback |
±3% uniformity across 200 mm wafers; repeatable batch-to-batch results. |
· All-in-One Processing – From ITO/SnO₂ ETL to Au/Ag electrodes, all in O₂/H₂O-free conditions.
· Co-Evaporation Capability – Precisely tune FA/MA/Cs perovskite stoichiometry via multi-source control.
· Organic-Metal Hybrid Deposition – Seamlessly switch between Alq3 emissive layers and Al cathodes.
· Shadow Mask Compatibility – ≤200 mm substrates enable RGB pixel patterning.
· Lithium Anode Protection – Deposit LiPON/Li₃PS₄ solid electrolytes without air exposure.
· High-Rate Metal Evaporation – >1 μm/min Ag current collectors for fast prototyping.
· Glovebox Coupling – Direct transfer to spin-coating/characterization modules (e.g., IV/CV testing).
· Future-Proof Upgrades – Add sputtering/PECVD via flange ports.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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