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High Vacuum Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor

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High Vacuum Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor High Vacuum Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor

High Vacuum Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor

  • Product Details

High Vacuum Electron Beam Evaporation Coating System For Layer Deposition In OLED, Solar Cell & Semiconductor




Lith-TK-DZ02-Precision Thin-Film Deposition Solution for Research & Industry


1. Product Overview

The Lith-TK-DZ02 is a high-performance electron beam evaporation system designed for advanced thin-film research and small-batch production. Featuring a compact vertical design with semi-automatic controls, it offers exceptional film uniformity and material versatility for both academic and industrial applications.


2. Key Features & Advantages

2.1 Precision Deposition Performance

· Achieves ≤±5% film thickness uniformity via rotating substrate holder (0-40 rpm)

· Ultra-high vacuum (6.0×10⁻⁵ Pa) ensures minimal contamination

· Fast pumping system reaches working vacuum in ≤30 minutes

2.2 Advanced Configuration Options

· 8kW E-gun with 6-crucible carousel (domestic/import options)

· Optional Kaufman ion source for improved film density and adhesion

· Triple resistive evaporation sources for low-temperature materials

2.3 User-Oriented Design

· PLC + touchscreen control for reproducible processes

· Compact footprint (2.5×1.6m) ideal for laboratory environments

· Comprehensive safety protection system (cooling/voltage/pressure monitoring)


3. Technical Specifications

Parameter

Specification

Chamber Design

Vertical cylinder, side-opening

Chamber Dimensions

Φ500 × H650 mm

Base Pressure

≤6.0×10⁻⁵ Pa

Pumping Speed

2000 L/s

Heating Temperature

RT - 300°C (substrate)

Substrate Stage

Φ200 mm rotating (max Φ300 mm loading)

Film Uniformity

≤±5%

E-Gun Power

8 kW

Control System

PLC + Touchscreen

Total Power Consumption

≥17 kW


4. Application Areas

4.1 Optical Coatings

· Anti-reflection coatings

· Laser optics

· IR filters and mirrors

4.2 Electronics & Semiconductors

· Conductive films (Au, ITO)

· Dielectric layers (SiO₂, Al₂O₃)

· Semiconductor device fabrication

4.3 Functional Materials

· Ferroelectric films (PZT)

· MEMS and sensor coatings

· Wear/corrosion resistant layers


5. Technical Highlights

5.1 Multi-Material Deposition

· Processes metals (Al, Au, Ti)oxides (SiO₂), and organic films

· Handles both low-vapor-pressure and refractory materials

5.2 Research-Grade Flexibility

· Supports multi-layer deposition for complex structures

· Substrate heating enables optimized film crystallization

5.3 Production-Ready Reliability

· Robust mechanical design for continuous operation

· Low maintenance requirements with easy consumable replacement


6. Why Choose TEMD500?

· Academic/Industrial Versatility: From basic research to pilot production

· Cost Efficiency: Lower operational costs than comparable systems

· Future Expandability: Modular design accepts process upgrades



Electron Beam Evaporation

High Vacuum Deposition





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity