ItemNo :
Lith-PC-DZ02MOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 days
Metal Evaporation Coating Equipment Manufacturer For Conductive, Semiconductor, Optical Coatings
Designed for high-throughput deposition of conductive films, semiconductor films, ferroelectric films, optical coatings, and other advanced thin-film materials. Ideal for industrial-scale production and laboratory R&D.
The system consists of:
· Evaporation Chamber: U-shaped design (1200 × 9000 × 800 mm), front-loading door, rear-mounted pumping system.
· Dual E-gun Evaporation Sources: Equipped with two high-power electron guns for simultaneous or sequential deposition.
· Thermal Evaporation Electrodes: Supports resistive heating for supplementary material deposition.
· Rotating Substrate Heater: Ensures uniform film thickness distribution.
· Gas Supply System: Precision mass flow controller (MFC) for reactive or inert gas introduction.
· Vacuum System: High-efficiency pumping system with ultra-low base pressure.
· Vacuum Measurement: Real-time monitoring of chamber pressure.
· Computer Control System: Automated process control with user-friendly interface.
· Mechanical Frame: Stable and vibration-resistant structure for precision coating.
|
Parameter |
Specification |
|
Ultimate Vacuum |
≤6.7×10-4 Pa |
|
Pump-Down Time (1×10-5 Pa → 5×10-3 Pa) |
≤20 min |
|
System Leak Rate |
≤6.7×10-7Pa·L/s |
|
Chamber Dimensions |
1200 × 9000 × 800 mm (U-shaped, front-opening) |
|
Electron Guns (2 sets) |
Anode Voltage: 10 kV |
|
Crucible (Water-Cooled) |
24-well design, 11 ml capacity per well |
|
Power Output |
0–10 kW (adjustable) |
|
Optional Resistive Source |
Compatible with thermal evaporation materials |
|
Substrate Capacity |
Holds 20× 4-inch substrates per batch |
|
Substrate Stage |
Continuous rotation (5–60 rpm), adjustable source-to-substrate distance (350 mm) |
|
Heating Temperature |
Up to 400°C (±1°C accuracy) |
|
Gas Flow Control |
1-channel mass flow controller (MFC) |
|
Thickness Monitor |
Quartz Crystal Microbalance (QCM), display range: 0–99,999 Å (0–999.99 nm) |
✔ High Deposition Rate & Uniformity – Dual e-gun design enables fast, large-area coating with excellent thickness control.
✔ Multi-Material Compatibility – Supports metals, oxides, semiconductors, and dielectrics with optional resistive heating.
✔ Precision Process Control – Automated QCM monitoring ensures repeatable film quality.
✔ Scalable Production – Optimized for batch processing with high substrate capacity.
✔ Stable Heating & Rotation – Reduces stress and improves adhesion for high-performance films.
Ideal for:
· Semiconductor & MEMS fabrication
· Optical & anti-reflective coatings
· Thin-film solar cells & sensors
· Academic & industrial research
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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ONLINE
+86 13174506016
Louis@lithmachine.com
+86 18659217588
18659217588
