Small Triple-Target Ion Sputtering Coater System

ItemNo :
Lith-ETD-2000III
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

Three-Targets Small Magnetron Sputtering Coating System

ETD-2000III Triple-Target Ion Sputtering Coater – Product Specifications

Key Features

Triple-target design for multi-material deposition in a single run

DC sputtering technology ensures reliable, high-quality thin-film coating

Versatile applications for SEM sample preparation, conductive layer coating, and protective film deposition

Adjustable parameters (gas, current, vacuum) for optimized film properties

Technical Specifications

Parameter Details

Target Materials
Standard: Au (50mm × 0.1mm)

Optional: Ag, Al, Pt, and more

Target Size 47mm diameter

Control Mode Manual operation

Chamber Dimensions Ø160mm × 120mm (H)

Sample Stage Adjustable (Ø50mm/70mm standard, customizable)

Sputtering Gas Ar, N₂, and others (selectable for different applications)

Sputtering Current Max 50mA (recommended ≤30mA)

Deposition Rate >40nm/min

Vacuum System High-performance vacuum pump included

Why Choose the ETD-2000III?

✔ Multi-material coating – Deposit three different materials without breaking vacuum
✔ Enhanced SEM imaging – Reduces charging effects on non-conductive samples
✔ Precision control – Adjustable gas flow, current, and vacuum for optimal film uniformity
✔ Wide compatibility – Supports biological, polymer, and advanced material samples

Applications

Electron-beam-sensitive samples (e.g., biological, polymers): Protective coating prevents beam damage

Non-conductive samples: Eliminates charging effects for crisp SEM imaging

Advanced materials research: Electrode fabrication and thin-film studies

Standard Package Includes

Main unit with triple-target configuration

Gold target (50mm × 0.1mm)

High-performance vacuum pump

Adjustable sample stage (50mm/70mm)

Optional Accessories

Additional target materials (Ag, Al, Pt, etc.)

Custom sample stage sizes

Note: The ETD-2000III is ideal for research labs, material science, and electron microscopy applications. Custom configurations available upon request.

Optimized for Performance · Designed for Researchers

(For detailed inquiries, contact our technical team for tailored solutions.)

Parameter	Details
Target Materials	Standard: Au (50mm × 0.1mm) Optional: Ag, Al, Pt, and more
Target Size	47mm diameter
Control Mode	Manual operation
Chamber Dimensions	Ø160mm × 120mm (H)
Sample Stage	Adjustable (Ø50mm/70mm standard, customizable)
Sputtering Gas	Ar, N₂, and others (selectable for different applications)
Sputtering Current	Max 50mA (recommended ≤30mA)
Deposition Rate	>40nm/min
Vacuum System	High-performance vacuum pump included

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

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