Email:Louis@lithmachine.com
ItemNo :
Lith-PD-200CMOQ :
1Compliance:
CE CertifiedWarranty:
1 yearDelivery Time:
5 daysEmail :
Louis@lithmachine.com
Model: PD-200C-DC/RF Sputtering, Multi-Target, Uniform Coating (±5%), Fast Deposition
Product Overview
The PD-200C is a compact magnetron sputtering system designed for laboratory-scale thin-film deposition. Compatible with both DC and RF sputtering sources, it supports the coating of metals, non-metals, and compound films (e.g., ITO). Ideal for academic and industrial research, it enables the preparation of single/multilayer films and facilitates advanced material/process development.
1. Robust Construction
·All-stainless-steel vacuum chamber ensures durability and operational safety.
·Optimized gas path design for enhanced process control.
2. Space-Efficient & Modular
·Compact footprint (500×360×380mm) with modular expandability, maximizing lab space utilization.
3. High-Efficiency Vacuum System
·Hybrid mechanical + imported molecular pump achieves high vacuum (≤3×10⁻⁵ Pa) in 15–20 minutes, reducing downtime.
4. Precision Process Control
·Uniformity: ≤±5% over Ø80mm substrate area.
·Rotating Substrate Holder: Adjustable speed (0–20 RPM) with magnetic fluid sealing for stable deposition.
5. Flexible Configuration
·Sputtering Sources: 2–3 × 2-inch targets (DC/mid-frequency/RF).
·Gas System: 1–3 gas inlets with ±1% flow accuracy (20 sccm).
|
Parameter |
Specification |
|
Vacuum Chamber |
Ø260 × H280mm (304 stainless steel, cylindrical, viewport) |
|
Vacuum System |
Mechanical pump + imported molecular pump |
|
Base Pressure |
≤3×10⁻⁵ Pa |
|
Pump-down Time |
≤3×10⁻⁴ Pa in 15min |
|
Substrate Holder |
Max. Ø80mm, rotation speed 0–20 RPM (adjustable) |
|
Sputtering Sources |
2–3 × 2-inch targets; 1KW DC/mid-frequency/RF power supply |
|
Uniformity |
≤5% (Ø80mm area) |
|
Gas Control |
1–3 channels, ±1% accuracy (20 sccm max) |
|
Control Mode |
Manual button or PLC touchscreen (with safety interlocks) |
|
Power Supply |
AC220V/50Hz, 2.5KW |
|
Dimensions (L×W×H) |
500 × 360 × 380mm |
Optional Upgrades: Substrate heating/cooling, dry pump, additional flow meters, water chiller.
· Research: Thin-film studies (metals, oxides, semiconductors).
· Education: Lab demonstrations and student projects.
· Industry: Prototyping for electronics, optics, and energy materials (e.g., ITO for solar cells).
Why PD-200C?
· Fast turnaround: Rapid pump-down accelerates experimental cycles.
· Scalable: Modular design adapts to evolving research needs.
· User-centric: Intuitive controls and safety features streamline operation.
PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity
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ONLINE
Louis@lithmachine.com
+0086 15959378975
