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Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

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  • Email : Louis@lithmachine.com
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Small PVD Thin Film Deposition Coating Machine System For Metals And Organics Small PVD Thin Film Deposition Coating Machine System For Metals And Organics Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

  • ItemNo :

    Lith-PD-200l
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Whatsapp :

    +86 18659217588
  • Wechat :

    18659217588
  • Product Details

Small PVD Thin Film Deposition Coating Machine System For Metals And Organics



PD-200l-High-Vacuum Evaporation Coating System


Product Overview

This system is a compact, multi-source high-vacuum evaporation coating platform designed for laboratory use, capable of depositing thin films of metals, organics, and other functional materials. It is ideal for:

· Research labs (metal electrode fabrication, SEM sample preparation).

· Advanced materials development (organic thin films).

· Process optimization (high-precision coatings for novel material synthesis).


Key Advantages vs. Competing Systems

Feature

This System

Typical Competing Systems

Vacuum Speed

15–20 min to high vacuum (≤5×10⁻⁵ Pa)

Often 30+ min for similar vacuum levels.

Film Uniformity

±3%–5% thickness deviation

Typically ±5%–10% in entry-level models.

Chamber Material

304 stainless steel (high corrosion resistance)

Some use aluminum or lower-grade steel.

Modularity

Supports 1–3 evaporation sources (expandable)

Fixed configurations common in low-end systems.

Footprint

Compact (500×360×420mm for desktop model)

Larger benchtop units often >600×500mm.


Technical Specifications

Parameter

Specification

Vacuum Chamber

304 stainless steel, cylindrical (Φ260×H350 mm)

Internal Coating Area

~Φ260×H310 mm

Ultimate Vacuum

≤5×10⁻⁵ Pa

Pumping Speed

≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours

Substrate Stage

- Max size: 80×80 mm (standard) / 120 mm diameter (rotary)

 - Rotation: 0–20 RPM (magnetic fluid sealed)

Film Uniformity

<5% (120 mm diameter area)

Evaporation Sources

2–3 sources (metal/organic compatible, co-evaporation or switching)

Power Supply

2 kW, constant current/power modes

Electrical

AC 220 V / 50 Hz, 3.5 kW

Dimensions (L×W×H)

- Main unit: 600×500×900 mm <br> - Desktop model: 500×360×420 mm


Why This System Stands Out?

1. Speed & Efficiency

o Achieves high vacuum 50% faster than comparable models, reducing idle time.

2. Precision Engineering

Stainless steel chamber + optimized gas paths ensure minimal contamination and long-term stability.

3. Flexible Configurations

o Modular design allows easy upgrades (e.g., adding a third evaporation source).

4. Space-Saving

30% smaller footprint than conventional systems, critical for crowded labs.


Ideal For:

✔ Universities studying thin-film physics.
✔ R&D centers developing flexible electronics or OLEDs.
✔ Industrial labs requiring high-repeatability coatings.

Order Note: Minimum 1 unit. Custom configurations available.

PVD Film Deposition

Small PVD Machine

Small PVD Machine




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity