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Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator

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Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator

Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator

  • ItemNo :

    Lith-PD-300
  • MOQ :

    1
  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :

    Louis@lithmachine.com
  • Whatsapp :

    +86 18659217588
  • Wechat :

    18659217588
  • Product Details

Lab Benchtop Physical Vapor Deposition Coating Equipment Thin Film Evaporator



PD-300-Thin Film Evaporator


Product Overview

The PD-300 system adopts an oil-free high-vacuum system with a large pumping-speed molecular pump, featuring an integrated electromechanical design for minimal lab space occupancy. It supports compatible metal and organic evaporation sources, offering high cost-effectiveness and user-friendly operation. Ideal for research institutes, electrode deposition, SEM sample preparation, and studies in OLED/solar cell technologies.


Key Features

1. Broad Application Scope

Optimized for evaporating noble metals (e.g., Au, Ag) in electrode preparation and semiconductor lift-off processes, reducing material waste.

2. Space-Saving & Durable

Compact footprint (550×900 mm) with a full stainless-steel vacuum chamber for enhanced durability and safety.

3. High-Efficiency Vacuum System

Oil-free molecular pump (≥300 L/s pumping speed) allows flexible installation angles, shortened pumping paths, and faster processing.

4. Multi-Source Compatibility

Configurable with 2–4 evaporation sources (metal/organic), supporting co-evaporation or sequential deposition.

5. Precision Control

Constant-current evaporation power supply, in-situ thickness monitoring, and excellent film uniformity (±3–5%) with high repeatability.

6. Upgradability

Optional non-stop venting and full automation control.


Technical Specifications

Core Parameters

Category

Specification

Chamber Dimensions (L×W×H)

300 × 300 × 450 mm (customizable height)

System Dimensions (L×W×H)

530 × 750 × 1800 mm (standard) / 1100 × 750 × 1500 mm (alternative)

Ultimate Vacuum

≤5×10−5 Pa

Base Pressure Holding

≤5 Pa (12 hrs), ≤8×10−4 Pa (30 min)

Substrate Stage

≤100 × 100 mm (max. 110 mm substrate or 25×15 mm ITO glass)

Source-Substrate Distance

>300 mm

Evaporation Sources

· Metal Sources: 2–3 groups (optional)

· Organic Sources: Beam-source furnace type, temperature-controlled (0–500°C), integrated adjustable baffle (0–15°), 2–3 groups (optional).

Power Requirements

· Voltage: AC 220 V/50 Hz (380 V optional)

· Power: ≤6 kW


Target Applications

· Research & Academia: Electrode deposition, SEM/TEM sample preparation.

· Advanced Materials: OLED encapsulation, perovskite solar cell R&D.

· Semiconductor: Metal lift-off processes, thin-film device fabrication.

Why Choose PD-300?

· Cost-Effective: Reduced material consumption and energy-efficient operation.

· User-Centric: Simplified controls, robust safety features, and modular upgrades.

· Future-Ready: Adaptable to evolving lab needs with optional automation.


PVD System

Thin Film Evaporator







PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity