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Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al, Metal And Perovskite Films

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Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al, Metal And Perovskite Films

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al, Metal And Perovskite Films

  • Product Details

Thermal Evaporation Evaporator Coating Coater System For Au, Ag, Al, Metal And Perovskite Films



Lith-QH-ZD01-High-Vacuum Multi-Material Evaporation


Product Overview

The Lith-QH-ZD01is a high-performance vacuum deposition system designed for precision thin-film coating applications in research and industrial laboratories. It features advanced vacuum technology, multi-source evaporation capabilities, and user-friendly controls, making it ideal for organic electronics, optoelectronics, and nanomaterials research.


Technical Specifications

No.

Parameter

Description

Vacuum Chamber

 

 

1

Ultimate Vacuum

Better than 4×10–5 Pa (new equipment)

2

Leak Rate

6.7×10–8 Pa·L/s

3

Working Vacuum

5×10–4 Pa (Time from atmosphere to working vacuum <30 min) (For N2-purged glovebox-integrated systems, cold state)

4

Vacuum Retention

Pressure remains below 3 Pa after 24 hours post shutdown

5

Sample Size

300 × 300 mm

6

Sample Holder Size

360 × 360 mm

7

Evaporation Sources

4 organic + 4 metal sources

8

Compatible Materials

C60, BCP, Cu, Ag, LiF, MoO3, Al, etc.

9

Evaporation Sources Configuration

 

 

Metal Sources: 4 water-cooled electrodes (compatible with 5cc ceramic Ta crucibles for Cu/Al).

 

 

Organic Sources: 4 standard Knudsen cells (10cc, max. 500°C).

 

 

Performance Metrics:

 

 

Organic (NPB standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).

 

 

Metal (Al standard): Deposition rate 0.5–3 Å/s (±0.1 Å/s stability), uniformity ±5% (≤300×300 mm).

 

10

Source-to-Substrate Distance

530 mm (metal sources include extendable electrode rods, default 100 mm).

11

Mask Library

Not included (customizable upon request).

12

Thickness Probes

4 imported probes (1 probe monitors 2 sources).

13

Thickness Display

Real-time touchscreen monitoring:

 - Individual source rate/thickness/temperature (Knudsen cells).

 - Total thickness/rate (large-font display).

14

Deposition Control

Organic sources: Rate/temperature control.

Metal sources: Rate control (manual/automated).

15

Software

Process lock function for repeatability.

16

Closed Pumping

Mechanical pump isolation feature to enhance productivity.


Key Advantages

1. High Precision & Uniformity

1. Stable deposition rates (≤±0.1 Å/s variation) and excellent uniformity (±5%) ensure reproducible thin films for sensitive applications like OLEDs and solar cells.

2. Multi-Source Flexibility

1. Simultaneous evaporation of organic/metallic materials (8 total sources) enables complex multilayer structures without breaking vacuum.

3. Robust Vacuum Performance

1. Ultra-high vacuum (4×10–5 Pa) and low leak rate (6.7×10–8 Pa·L/s) guarantee contamination-free coatings.

4. User-Centric Design

1. Intuitive touchscreen interface, real-time monitoring, and glovebox compatibility streamline workflow for lab environments.


Recommended Applications

· Research: Organic semiconductors, perovskite solar cells, quantum dots.

· Industry: Optical coatings, flexible electronics, barrier films.

· Education: Thin-film deposition training, material science experiments.


Evaporation Coater





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity