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Lab Combinatorial Plasma Sputtering Coating Coater Machine With Three 2'' Magnetron Sputtering Sources

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Lab Combinatorial Plasma Sputtering Coating Coater Machine With Three 2'' Magnetron Sputtering Sources

Lab Combinatorial Plasma Sputtering Coating Coater Machine With Three 2'' Magnetron Sputtering Sources

  • ItemNo :

    VTC-600-3HD-LD
  • MOQ :

    1
  • Lead Date :

    20 days
  • Net Weight:

  • Shipping Dimension:

  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

  • Dimension(L*W*H):

  • Email :

    [email protected]
  • Product Details

Lab Combinatorial Plasma Sputtering Coating Coater Machine With Three 2'' Magnetron Sputtering Sources


VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.


SPECIFICATIONS


Compact Structure

          


Input Power

  • Single phase 220 VAC 50 / 60 Hz
  • 2000 W (including vacuum pump and water chiller)




Source Power

  • Three sputtering power sources are integrated into one control box (Click picture below to see detailed specs)
    • DC source: 500 W power for coating metallic materials (Pic 1)
    • RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)

           






Magnetron Sputtering Head

  • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included
  • One Sputting Head Model also available.
    • Target size requirement: 2" diameter
    • Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)
    • One Stainless Steel Target and one Research Grade Al2O3 target are included for demo testing
    • Optional 2" sputtering targets (or backing plate) are available upon request at extra cost.
    • Recommended Sputtering Recipe and Useful Tips
  • Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF (Please select from Product Options)
  • Optional: 148 cm RF cable can be ordered at extra cost for replacement

                  




Vacuum Chamber

  • Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
  • Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
  • Hinged type lid with pneumatic power pole allows easy target change

         




Sample Stage

  • Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover
  • Sample holder size: 140 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

   

Gas Flow Control

  • Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases

    • Flow rate: 0 – 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel
  • Air inlet valve is installed for vacuum release

Vacuum Pump Station 

  

  • A mobile pump station is included. The sputtering coater can be placed on top of station
  • High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed
  • Standard vacuum level connected with chamber : < 4.0E-5 Torr. .  (1.0E-6 Torr with chamber baking )
  • Optional at extra cost
  • If choose a 150L/S high speed turbo pump, vacuum can reach 10-6 torr  with chamber  ( 6x10-7 torr with baking)
  • For the ultra-high vacuum upto 10^-7 torr, a getter pump (100L/s H2 & O2) is needed in addition to the turbo pump. Please consult our engineers for detailed customization.
  •  150L/S high speed turbo pump        
  •   Getter Pump

Water Chiller

  • One digital temperature controlled recirculating water chiller is included. 
  • Refrigeration range: 5~35 °C
  • Flow rate: 16 L/min
  • Pump pressure: 14 psi




Optional

  • Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
  • Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at extra cost
  • Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at TMAX

       


Overall Dimensions

      

Net Weight of Coater

  • 160 kg

Shipping Weight & Dimensions

  • Total 3 Pallets
  • 365 lbs, 48" x 40" x 45"

  • 390 lbs, 48"x 40" x 49"

  • 210 lbs, 48" x 40"x 30"

Compliance

  • CE approval
  • MET Certification (UL 1450) is available upon request at extra cost, please contact our sales representative for the quote. 

              

Warranty

  • One years limited warranty with lifetime support

 Application Notes

  • A two-stage pressure regulator (not included) should be installed on gas cylinder to limit the gas output pressure below 0.02 MPa for safe usage
  • In order to remove oxygen from the chamber, TMAX suggest you to use 5% Hydrogen + 95 % Nitrogen to clean the chamber 2-3 times, which can reduce oxygen level to < 10 ppm
  • Please use > 5N purity Argon gas for plasma sputtering. Even though 5N purity Ar usually contains 10 - 100 ppm oxygen and H2O depending on the supplier. TMAX suggest you to use gas purification device to purify gas before filling in.
  • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below for target bonding 
  • Lith supplies single crystal substrate from A to Z
  • Lith Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C
  • Test the flexibility of the thin film / coated electrode with EQ-MBT-12-LD mandrel bending tester.
  • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF / DC generator before sample loading and target changing operations
  • DO NOT use tap water in water chiller. Must use Rust Protection Coolants to prevent rust and corrosion.




Plasma Sputtering Coater









PACKAGE:

  1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

  2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

  3 Responsible for the damage during the shipping process, will change the damaged part for you for free.

 

DELIVERY TIME:15-20 days after confirming the order, detail delivery date should be decided according to 

production season and order quantity.