Home Products Lab Coater Sputtering Coater

Lab 5 Guns RF Plasma Magnetron Sputtering System For Initiative (MGI) Thin Film Research

Product Categories

Contact Us

  • Contact Person : Louis Yang
  • Email :
  • Address : No. 5 Nanshan Road, Huli District, Xiamen City, Fujian Province, China
Lab 5 Guns RF Plasma Magnetron Sputtering System For Initiative (MGI) Thin Film Research

Lab 5 Guns RF Plasma Magnetron Sputtering System For Initiative (MGI) Thin Film Research

  • ItemNo :

  • MOQ :

  • Compliance:

    CE Certified
  • Warranty:

    1 year
  • Delivery Time:

    5 days
  • Email :
  • Product Details

Lab 5 Guns RF Plasma Magnetron Sputtering System For Initiative (MGI) Thin Film Research

VTC-5RF is 5 guns RF plasma magnetron sputtering system designed for high throughput material genome initiative (MGI) thin film research, enabling exploration of new generations of materials via combinatorial sputtering for both metallic and non-metallic materials. The system is capable of a five-element combinatorial coating of up to 16 samples with varying compositions, making it especially good for searching high-performance solid state electrolyte materials, magnetic alloys, and multiferroic materials.



  • 5 magnetron sputtering guns for 5 different target materials
  • Depending on the power supplies used (RF or DC), both metallic and non-metallic materials can be deposited. 
  • Capable of sputtering 5 target materials to produce various compositions via different sputtering times / rates
  • With optional 5 power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering
  • 16 samples can be deposited in one batch with a mask and a rotating sample holder

Input Power

  • Single phase 220 VAC, 50 / 60 Hz
  • 1000 W (including vacuum pump and water chiller)

Power Source

  • One 13.5 MHz,300 W auto-match RF generator is included and connected to the sputtering heads
  • The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” without breaking of vacuum during a multilayer process.
  • Multiple RF power supplies are optional, which allows user to sputter multi-target at the same time for combinatorial sputtering
  • Laptop with control software is available at extra cost to control each RF gun's sputtering time and power


  • You may choose DC power supply for metallic target sputtering
  • With five DC or RF power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering

Magnetron Sputtering Head

  • Five 1" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
  • RF cable replacement can be purchased at TMAX
  • One manually operated shutter is built on the flange (See Pic #3)    
  • One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads

Sputtering Target

  • Target size requirement: 1" diameter x 1/8" thickness max
  • Sputtering distance range: 50 – 80 mm adjustable
  • Sputtering angle range: 0 – 25° adjustable 
  • 1" diameter Cu target and Al2O3 target are included for demo testing
  • Various oxide 1” sputtering targets are available upon request at extra cost
  • For target-bonding, 1 mm and 2 mm copper backing plates are included. Silver epoxy (Pic #1) and extra copper backing plates (Pic #2) can be ordered at TMAX

Vacuum Chamber

  • Vacuum chamber is made of 304 stainless steel with reinforcing rib 
  • Inside vacuum chamber size:  470 mm L × 445 mm D × 522 mm H  (~105 Liters, 18.5“x17.5"x 20.5")
  • Round 380 mm Dia. hinged type door with 150 mm Dia glass window
  • Temperature range: -15 to 150 °C
  • Vacuum level: 4.0E-5 torr with turbo pump

Sample Holder

  • 150 mm diameter rotatable sample holder for coating 16 sample one one batch with different compositions
  • Sample holder and mask rotation can be controlled manually by a button or automatically by a control software (Optional)
  • The sample holder temperature is adjustable from RT to 600 °C max 


Vacuum Pump

  • KF40 vacuum port is built in for connecting to a vacuum pump.
  • A compact turbo pump is included
  • 4.0E-5 Torr with optional turbo pump 


  • Precision quartz thickness sensor is optional. It can be built into the chamber to monitor coating thickness with accuracy 0.1 Å (water cooling required) 
    • Easy USB connection to PC for remote thickness and coating speed monitoring
    • 5 pcs quartz sensors (consumable) are included 

Net Weight

  • 60 kg


  • CE approval
  • MET Certification (UL 1450) is available upon request at extra cost, please contact our sales representative for quote. 



  • One years limited warranty with lifetime support 

Application Notes

  • This compact 1" RF magnetron sputtering coater is designed for coating oxide thin films on oxide single crystal substrates, which usually does not need high vacuum set-up
  • A two-stage pressure regulator (not included) should be installed on the gas cylinder to limit the output pressure of gas to below 0.02 MPa for safe usage. Please use > 5N purity Ar gas for plasma sputtering
  • For the best film-substrate adhesion strength, please clean the substrate surface before coating:
    • Ultrasonic cleaning with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture
    • Plasma cleaning may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal
    • A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve adhesion of metals and alloys
  • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below (#3) for target-bonding
  • Lith supplies single crystal substrate from A to Z
  • Lith RF Plasma Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C
  • Test the flexibility of the thin film/coated electrode with EQ-MBT-12-LD mandrel bending tester.
  • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF generator before sample loading and target changing operations
  • DO NOT use tap water in water chiller. Use coolant, DI water, distilled water, or anti-corrosive additives with water

Plasma Magnetron Sputtering


  1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

  2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

  3 Responsible for the damage during the shipping process, will change the damaged part for you for free.


DELIVERY TIME:15-20 days after confirming the order, detail delivery date should be decided according to 

production season and order quantity.