PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

ItemNo :
Lith-SD-900C
MOQ :
1
Compliance:
CE Certified
Warranty:
1 year
Delivery Time:
5 days
Email :
Louis@lithmachine.com

Contact Now

Product Details

PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

Dual-function SEM Sample Preparation Instrument

1. Technical Specifications

Vacuum System

Parameter	Specification
Rotary Pumping Speed	50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s)
Vacuum Limit	2 Pa
Max Sputtering Current	100 mA
Max Evaporation Current	100 A
Sputtering Working Pressure	20 Pa – 8 Pa
Evaporation Working Pressure	6 Pa – 4 Pa
Working Vacuuming Time	< 5 min (to 2 Pa)
Vacuum Measurement	Atmosphere to 2×10 mbar
Gas Control	Gas Flow Controller
Chamber Size	Ø150 × 120 mm (height), scratch-resistant quartz glass
Magnetron Target Source	Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt
Evaporation Target Source	Carbon Rope
Operation Method	Manual (instruction manual included)
Dimensions (Main Unit)	360 mm (L) × 300 mm (W) × 380 mm (H)
Dimensions (Evaporation Unit)	360 mm (L) × 300 mm (W) × 160 mm (H)
Weight	55 kg
Power Supply	AC 110V 60Hz or AC 220V 50Hz
Power Consumption	< 2000 W
Cooling Method	Air Cooling (Evaporation) + Water Cooling (Sputtering)
Warranty	1-year limited warranty with lifetime product support

Sputtering Parameters

· Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu

· Target Size: Ø50 mm

· Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable)

· Sputtering Voltage: 0–1600 V (DC, adjustable)

· Sputtering Current: 0–50 mA

· Sputtering Time: 0–360 s

Evaporation Parameters

· Evaporation Material: Carbon fiber rope

· Evaporation Current: 0–100 A (AC)

· Evaporation Voltage: 0–30 V

· Evaporation Time: 0–1 s

· Micro Vacuum Valve: Compatible with Ø3 mm tubing

General

· Input Voltage: 220 V (110 V optional), 50 Hz

· Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8)

2. Key Features

Dual-Function Advantages

· Integrated Design: Combines metal sputtering and carbon evaporation in one compact system

· Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films

· Time Efficiency: 5-minute pump-down enables rapid sample processing

User-Centric Design

· Transparent chamber for real-time monitoring

· Ergonomic controls with preset programs

· Tool-free target replacement system

Sputter Coater

PVD Sputter Coating

Carbon Coater

PACKAGE:
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity